Plasma Sources

Plasma Souces: Ferromagnetic Enhanced ICP

Plasma Sensors designs and builds custom ferromagnetic enhanced ICP sources, FMICP.

Our proprietary technology brings about unique combination of compactness, high power transfer efficiency and negligible DC bias and RF plasma potential. FMICP operate in noble, atomic and molecular gas mixtures over wide range of gas pressure and RF power.

FMICP applications are: ion, electron or plasma sources for space propulsion and material treatment, remote plasma sources for process control and diagnostics in commercial reactors, plasma sources for R&D and academic research.

FMICP is complemented with a high efficiency RF generator with auto-matching and display of the plasma power absorption.

High efficiency ICP source with adjustable plasma distribution. US Patent 8,444,870

This source reliably operates over wide range of gas pressure (1 mTorr - 10 Torr) and RF power (15 W - 500 W). Extremely low DC and RF plasma potentials. PSST 20, 0255004 (2011).

RF power supply

10 - 300 W power range
High efficiency power conversion (> 70%)
Internal auto-matching to the coupler
Voltage boosting for the discharge ignition
Protection against overload and plasma extinction
Display of the plasma absorbed power CW, pulsed and modulated operation

Compact Remote Plasma Source for Process Control and Diagnostics - CRPS

CRPS is a multi purpose attachment to processing chambers for plasma ignition, end-process (EP) detection, gas composition analysis and plasma grounding.

Seed plasma injection for the processing chamber ignition
End-process detection by three independent methods: spectroscopy, ion flux and CRPS driving voltage
Linking spectroscopy with EEDF measurements for precision gas composition analysis
Plasma grounding to prevent wall sparking and to enable wafer DC biasing and probe diagnostics in coated chambers.